FinFETs junctions optimization by conventional ion implantation for (sub-)22nm technology nodes circuit applications

Veloso, AnabelaAnabelaVelosoDe Keersgieter, AnAnDe KeersgieterBrus, StephanStephanBrusHoriguchi, NaotoNaotoHoriguchiAbsil, PhilippePhilippeAbsilHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-182021-10-182010-09https://imec-publications.be/handle/20.500.12860/18253FinFETs junctions optimization by conventional ion implantation for (sub-)22nm technology nodes circuit applicationsProceedings paper