Vaglio Pret, AlessandroAlessandroVaglio PretPoliakov, PavelPavelPoliakovBianche, DavideDavideBiancheGronheid, RoelRoelGronheidBlomme, PieterPieterBlommeMiranda Corbalan, MiguelMiguelMiranda CorbalanVan Houdt, JanJanVan HoudtDehaene, WimWimDehaene2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18130Roughness analysis for (EUV) optical lithographyOral presentation