Selectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern Design

Mandal, Akhilesh KumarAkhilesh KumarMandalvan der Veen, MarleenMarleenvan der VeenRahnemaihaghighi, NeginNeginRahnemaihaghighiRobson, MaxMaxRobsonClaessens, NielsNielsClaessensMeersschaut, JohanJohanMeersschautJourdan, NicolasNicolasJourdanTokei, ZsoltZsoltTokeiDelabie, AnneliesAnneliesDelabie2024-09-262024-01-232024-09-2620242365-709XWOS:001141978900001https://imec-publications.be/handle/20.500.12860/43444Selectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern DesignJournal article10.1002/admt.202301820WOS:001141978900001ATOMIC LAYER DEPOSITIONCHEMICAL-VAPOR-DEPOSITIONTHIN-FILMCOPPERRUDIFFUSION