Gronheid, RoelRoelGronheidRen, HuanHuanRenCheng, GuojieGuojieChengSah, KaushikKaushikSahGao, XuXuGaoTang, WeiweiWeiweiTangChen, ZhijinZhijinChenZafar, KhurramKhurramZafarGroeger, PhilipPhilipGroegerBald, HolgerHolgerBaldBeaufort, Gaetan De LiedekerkeGaetan De LiedekerkeBeaufortHabets, BorisBorisHabetsLariviere, StephaneStephaneLariviereBaudemprez, BartBartBaudemprezSebaai, FaridFaridSebaai2025-07-312025-07-312025978-1-5106-8634-20277-786XWOS:001517286200008https://imec-publications.be/handle/20.500.12860/45988Influence of Wafer Topography on Focus Control and Defectivity in EUV LithographyProceedings paper10.1117/12.3051869978-1-5106-8635-9WOS:001517286200008