Redolfi, AugustoAugustoRedolfiKubicek, StefanStefanKubicekRooyackers, RitaRitaRooyackersKim, Min-SooMin-SooKimSleeckx, ErikErikSleeckxDevriendt, KatiaKatiaDevriendtShamiryan, DenisDenisShamiryanVandeweyer, TomTomVandeweyerDelande, TinneTinneDelandeHoriguchi, NaotoNaotoHoriguchiTogo, MitsuhiroMitsuhiroTogoWouters, Johan M. D.Johan M. D.WoutersJurczak, GosiaGosiaJurczakHoffmann, Thomas Y.Thomas Y.HoffmannCockburn, AndrewAndrewCockburnGravey, VirginieVirginieGraveyDiehl, D.L.D.L.Diehl2021-10-202021-10-2020120038-1101https://imec-publications.be/handle/20.500.12860/21388Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniquesJournal article