UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning

Li, LiLiLiAlay, Josep LluisJosep LluisAlayMertens, PaulPaulMertensMeuris, MarcMarcMeurisVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeynsDe Blank, ReneReneDe BlankSchuivens, EugeneEugeneSchuivens2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/229UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaningProceedings paper