Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications

Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxPittevils, JorisJorisPittevilsVereecke, GuyGuyVereeckeStruyf, HerbertHerbertStruyfDe Gendt, StefanStefanDe Gendt2021-10-202021-10-2020120013-4651https://imec-publications.be/handle/20.500.12860/20915Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applicationsJournal article