Understanding of trap-assisted tunneling current - assisted by oxygen vacancies in RuOx/SrTiO3/TiN MIM capacitor for the DRAM Application

Kim, Min-SooMin-SooKimKaczer, BenBenKaczerStarschich, SergejSergejStarschichPopovici, Mihaela IoanaMihaela IoanaPopoviciSwerts, JohanJohanSwertsRichard, OlivierOlivierRichardTomida, KazuyukiKazuyukiTomidaVrancken, ChristaChristaVranckenVan Elshocht, SvenSvenVan ElshochtDebusschere, IngridIngridDebusschereAltimime, LaithLaithAltimimeKittl, JorgeJorgeKittl2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20938Understanding of trap-assisted tunneling current - assisted by oxygen vacancies in RuOx/SrTiO3/TiN MIM capacitor for the DRAM ApplicationProceedings paper