Integrated diffusion-recombination model for describing the logarithic time dependency of plasma damage in porous low-k materials

Kunnen, EddyEddyKunnenBarkema, GerardGerardBarkemaMaes, ChristianChristianMaesShamiryan, DenisDenisShamiryanUrbanowicz, AdamAdamUrbanowiczStruyf, HerbertHerbertStruyfBaklanov, MikhaïlMikhaïlBaklanov2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/19207Integrated diffusion-recombination model for describing the logarithic time dependency of plasma damage in porous low-k materialsJournal article