Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometry

Hellin, DavidDavidHellinBearda, TwanTwanBeardaZhao, ChaoChaoZhaoRaskin, G.G.RaskinMertens, PaulPaulMertensDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsVinckier, ChrisChrisVinckier2021-10-152021-10-152003-12https://imec-publications.be/handle/20.500.12860/7644Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometryJournal article