Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

Hourd, Andrew C.Andrew C.HourdGrimshaw, AnthonyAnthonyGrimshawScheuring, GerdGerdScheuringGittinger, ChristianChristianGittingerBrück, Hans-JürgenHans-JürgenBrückChen, Shiuh-BinShiuh-BinChenChen, Parkson W.Parkson W.ChenHartmann, HansHansHartmannOrdynskyy, VladimirVladimirOrdynskyyJonckheere, RikRikJonckheerePhilipsen, VickyVickyPhilipsenSchätz, ThomasThomasSchätzSommer, KarlKarlSommer2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6407Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary resultsProceedings paper