Degradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profiling

Conard, ThierryThierryConardFranquet, AlexisAlexisFranquetTsvetanova, DianaDianaTsvetanovaMouhib, TariqTariqMouhibVandervorst, WilfriedWilfriedVandervorst2021-10-212021-10-2120130142-2421https://imec-publications.be/handle/20.500.12860/22166Degradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profilingJournal articlehttp://onlinelibrary.wiley.com/doi/10.1002/sia.5126/abstract