Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric Layer

Agarwal, A.A.AgarwalWalke, AmeyAmeyWalkeRonchi, NicoloNicoloRonchiKao, K. -H.K. -H.KaoVan Houdt, JanJanVan Houdt2025-07-032024-06-242025-07-0320240018-9383WOS:001248174200001https://imec-publications.be/handle/20.500.12860/44085Study of Endurance Performance of SiO2 Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO2 Ferroelectric LayerJournal article10.1109/TED.2024.3409204WOS:001248174200001IMPACT