Development of a new post-etch photoresist stripper for copper BEOL process

Du, BingBingDuKneer, EmilEmilKneerTownsend, P.H.P.H.TownsendLe, Quoc ToanQuoc ToanLeHendrickx, DirkDirkHendrickxVereecke, GuyGuyVereecke2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12105Development of a new post-etch photoresist stripper for copper BEOL processProceedings paper