Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide

Cimino, S.S.CiminoPantisano, LuigiLuigiPantisanoPacagnella, A.A.PacagnellaGroeseneken, GuidoGuidoGroeseneken2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7322Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxideOral presentation