Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Murugesan Kuppuswamy, Vijaya-KumarVijaya-KumarMurugesan KuppuswamyConstantoudis, VassiliosVassiliosConstantoudisGogolides, EvangelosEvangelosGogolidesVaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheid2021-10-212021-10-2120131537-1646https://imec-publications.be/handle/20.500.12860/22838Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencherJournal article