Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Hendrickx, EricEricHendrickxTritchkov, AlexanderAlexanderTritchkovSakajiri, KyoheiKyoheiSakajiriGranik, YuriYuriGranikKempsell, MonicaMonicaKempsellVandenberghe, GeertGeertVandenberghe2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13857Hyper-NA imaging of 45nm node random CH layouts using inverse lithographyProceedings paper