Double patterning process with resist freezing technique

Hoshiko, KenjiKenjiHoshikoShioya, TakeoTakeoShioyaFujiwara, KoichiKoichiFujiwaraYamaguchi, YoshikazuYoshikazuYamaguchiShimokawa, TsutomuTsutomuShimokawaMaenhoudt, MireilleMireilleMaenhoudtMiller, AndyAndyMillerVangoidsenhoven, DizianaDizianaVangoidsenhoven2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13893Double patterning process with resist freezing techniqueProceedings paper