Ortolland, ClaudeClaudeOrtollandRosseel, ErikErikRosseelHoriguchi, NaotoNaotoHoriguchiKerner, ChristophChristophKernerMertens, SofieSofieMertensKittl, JorgeJorgeKittlVerleysen, EvelineEvelineVerleysenBender, HugoHugoBenderVandervorst, WilfriedWilfriedVandervorstLauwers, AnneAnneLauwersAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemansMathukrishnan, S.S.MathukrishnanSrinivasan, S.S.SrinivasanMayur, A.J.A.J.MayurSchreutelkamp, RobRobSchreutelkampHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15953Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technologyProceedings paper