Concurrent design rule, OPC and process optimization in EUV lithography

Xu, DongboDongboXuGillijns, WernerWernerGillijnsTan, Ling EeLing EeTanLee, Jae UkJae UkLeeKim, Ryan Ryoung hanRyan Ryoung hanKim2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/36370Concurrent design rule, OPC and process optimization in EUV lithographyMeeting abstracthttps://doi.org/10.1117/12.2553212