High-Fidelity Directed Self-Assembly Using Higher-Ï Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features

Maekawa, ShinsukeShinsukeMaekawaVerstraete, LanderLanderVerstraeteSuh, Hyo SeonHyo SeonSuhSeshimo, TakehiroTakehiroSeshimoDazai, TakahiroTakahiroDazaiSato, KazufumiKazufumiSatoHatakeyama-Sato, KanKanHatakeyama-SatoNabae, YutaYutaNabaeHayakawa, TeruakiTeruakiHayakawa2025-02-272025-02-272025-FEB 11616-301XWOS:001419087100001https://imec-publications.be/handle/20.500.12860/45265High-Fidelity Directed Self-Assembly Using Higher-Ï Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm FeaturesJournal article10.1002/adfm.202421066WOS:001419087100001COPOLYMER THIN-FILMSBLOCK-COPOLYMERSCHEMICAL-PATTERNSMICRODOMAINSPHOTORESISTSLITHOGRAPHYSEGREGATIONPOLYMERS