Conard, ThierryThierryConardHuyghebaert, CedricCedricHuyghebaertVandervorst, WilfriedWilfriedVandervorst2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8715ToF-SIMS profiling of HfO2/Si stacks: influence of sputtering condition of profile shapeJournal article