Santos, AndreiaAndreiaSantosKosma, VasilikiVasilikiKosmaVandereyken, JelleJelleVandereykenMarhfour, H.H.MarhfourTanaka, Y.Y.TanakaHarumoto, M.M.HarumotoAsai, M.M.AsaiStokes, H.H.StokesSuh, Hyo SeonHyo SeonSuhFoubert, PhilippePhilippeFoubertDe Simone, DaniloDaniloDe Simone2022-09-082022-09-082022-09-082021978-1-5106-4057-30277-786XWOS:000844537900014https://imec-publications.be/handle/20.500.12860/40388EUV lithographic process enablement with novel litho track hardwareProceedings paper10.1117/12.2584515978-1-5106-4058-0WOS:000844537900014COLD DEVELOPMENTIMPROVEMENT