Integrated diffusion - recombination model for describing the logarithmic time dependence of plasma damage in porous low-k materials

Kunnen, EddyEddyKunnenBarkema, GerardGerardBarkemaMaes, ChristianChristianMaesShamiryan, DenisDenisShamiryanUrbanowicz, AdamAdamUrbanowiczStruyf, HerbertHerbertStruyfBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17408Integrated diffusion - recombination model for describing the logarithmic time dependence of plasma damage in porous low-k materialsMeeting abstract