Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etching

Tinck, StefanStefanTinckBogaerts, AnnemieAnnemieBogaertsBoullart, WernerWernerBoullart2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18088Modeling the influence of gas composition in an Ar/Cl2/O2 inductively coupled plasma used for STI etchingMeeting abstract