Scaling trends toward N3 and beyond: Device architecture and standard cells innovation impact on patterning and layout

Spessot, AlessioAlessioSpessot2021-10-262021-10-262018-06https://imec-publications.be/handle/20.500.12860/31837Scaling trends toward N3 and beyond: Device architecture and standard cells innovation impact on patterning and layoutProceedings paperhttps://www.lithoworkshop.org/assets/archive/2018/2018-Lithography-Workshop-Program-Book-v1.2.pdf