Christiano, VerônicaVerônicaChristianoAdelmann, ChristophChristophAdelmannKellermann, GuintherGuintherKellermannVerdonck, PatrickPatrickVerdonckDos Santos Filho, Sebastio G.Sebastio G.Dos Santos Filho2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18695Physical characterization of high-k HfxAl1-xOy gate dielectrics prepared by ALDProceedings paper