Ronse, KurtKurtRonseDe Bisschop, PeterPeterDe BisschopVandenberghe, GeertGeertVandenbergheHendrickx, EricEricHendrickxGronheid, RoelRoelGronheidVaglio Pret, AlessandroAlessandroVaglio PretMallik, ArindamArindamMallikVerkest, DiederikDiederikVerkestSteegen, AnAnSteegen2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21425Opportunities and challenges in device scaling by the introduction of EUV lithographyProceedings paper