de Marneffe, Jean-FrancoisJean-Francoisde MarneffeLazzarino, FredericFredericLazzarinoGoossens, DannyDannyGoossensConard, ThierryThierryConardHoflijk, IlseIlseHoflijkShamiryan, DenisDenisShamiryanStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullart2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/16952The metal hard-mask approach for contact patterningProceedings paper