Onitsuka, TomoyaTomoyaOnitsukaKawakami, ShinichiroShinichiroKawakamiDauendorffer, ArnaudArnaudDauendorfferShimura, SatoruSatoruShimuraNafus, KathleenKathleenNafusFeurprier, YannickYannickFeurprierFoubert, PhilippePhilippeFoubertDe Simone, DaniloDaniloDe Simone2023-01-172021-11-022023-01-172021978-1-5106-4051-10277-786XWOS:000672825700034https://imec-publications.be/handle/20.500.12860/37692Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)Proceedings paper10.1117/12.2583809978-1-5106-4052-8WOS:000672825700034