Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application

Niwa, MasaakiMasaakiNiwaMitsuhashi, RiichirouRiichirouMitsuhashiYamamoto, K.K.YamamotoHayashi, S.S.HayashiHarada, YoshinaoYoshinaoHaradaRothschild, AudeAudeRothschildHoffmann, Thomas Y.Thomas Y.HoffmannKubicek, StefanStefanKubicekDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsBiesemans, SergeSergeBiesemansKubota, M.M.Kubota2021-10-162021-10-162005-10https://imec-publications.be/handle/20.500.12860/10933Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP applicationProceedings paper