Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress

Rafi, J.M.J.M.RafiSimoen, EddyEddySimoenMercha, AbdelkarimAbdelkarimMerchaCollaert, NadineNadineCollaertCampabadal, F.F.CampabadalClaeys, CorCorClaeys2021-10-182021-10-1820091071-1023https://imec-publications.be/handle/20.500.12860/16075Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stressJournal article