Lee, F.F.LeeMarcus, S.S.MarcusShero, E.E.SheroWilk, G.G.WilkSwerts, JohanJohanSwertsMaes, JanJanMaesBlomberg, T.T.BlombergDelabie, AnneliesAnneliesDelabieGros-Jean, M.M.Gros-JeanDeloffre, E.E.Deloffre2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12455Atomic layer deposition: an enabling technology for microelectronic device manufacturingProceedings paper