15nm half-pitch patterning: EUV + SELF-aligned double patterning

Versluijs, JankoJankoVersluijsSouriau, LaurentLaurentSouriauHellin, DavidDavidHellinOrain, IsabelleIsabelleOrainKimura, YoshieYoshieKimuraKunnen, EddyEddyKunnenDekkers, HaroldHaroldDekkersShi, XiaopingXiaopingShiAlbert, JohanJohanAlbertWiaux, VincentVincentWiauxXu, KaidongKaidongXu2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/2179715nm half-pitch patterning: EUV + SELF-aligned double patterningOral presentation