Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma

Le, Quoc ToanQuoc ToanLeKeldermans, JohanJohanKeldermansChiodarelli, NicoloNicoloChiodarelliKesters, ElsElsKestersLux, MarcelMarcelLuxClaes, MartineMartineClaesVereecke, GuyGuyVereecke2021-10-172021-10-1720080021-4922https://imec-publications.be/handle/20.500.12860/14002Alternative photoresist removal process to minimize damage of low-k material induced by ash plasmaJournal article