Anomalous low-temperature dopant diffusion from in-situ doped polycrystalline and epitaxial Si layers into the monocrystalline Si substrate

Caymax, MattyMattyCaymaxBaert, KrisKrisBaertPoortmans, JefJefPoortmansVandervorst, WilfriedWilfriedVandervorst2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/70Anomalous low-temperature dopant diffusion from in-situ doped polycrystalline and epitaxial Si layers into the monocrystalline Si substrateJournal article