Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance

Wostyn, KurtKurtWostynRondas, DirkDirkRondasLoo, RogerRogerLooDhayalan, Sathish KumarSathish KumarDhayalanHikavyy, AndriyAndriyHikavyyElskens, WimWimElskensVyncke, AlexAlexVynckeMertens, PaulPaulMertensHolsteyns, FrankFrankHolsteynsDe Gendt, StefanStefanDe GendtMasaoka, ToruToruMasaokaYoshida, YukifumiYukifumiYoshidaBast, GerhardGerhardBastSimpson, GavinGavinSimpson2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26185Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performanceMeeting abstract