Chemical mechanical planarization of patterned InP in shallow trench isolation (STI) template structures using hydrogen peroxide-based silica slurries containing oxalic acid or citric acid

Matovu, John B.John B.MatovuOng, PatrickPatrickOngTeugels, LieveLieveTeugelsLeunissen, PeterPeterLeunissenBabu, S. V.S. V.Babu2021-10-222021-10-2220140167-9317https://imec-publications.be/handle/20.500.12860/24228Chemical mechanical planarization of patterned InP in shallow trench isolation (STI) template structures using hydrogen peroxide-based silica slurries containing oxalic acid or citric acidJournal articlehttp://www.sciencedirect.com/science/article/pii/S0167931713006849