Cangemi, MichaelMichaelCangemiPhilipsen, VickyVickyPhilipsenLeunissen, PeterPeterLeunissenDe Ruyter, RudiRudiDe RuyterJonckheere, RikRikJonckheereMartin, PatrickPatrickMartinWakefield, ClareClareWakefieldBuxbaum, AlexAlexBuxbaumMorisson, TroyTroyMorisson2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10174Impact of AAPSM etch depth linearity in ArF immersion lithographyProceedings paper