The impact of backside particles on the limits of optical lithography

Bearda, TwanTwanBeardaMertens, PaulPaulMertensHolsteyns, FrankFrankHolsteynsDe Bisschop, PeterPeterDe BisschopCompen, R.R.Compenvan Meer, R.R.van MeerHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8547The impact of backside particles on the limits of optical lithographyOral presentation