Loo, RogerRogerLooSouriau, LaurentLaurentSouriauOng, PatrickPatrickOngKenis, KarineKarineKenisRip, JensJensRipStorck, PeterPeterStorckBuschhardt, ThomasThomasBuschhardtVorderwester, MartinMartinVorderwester2021-10-182021-10-182010-05https://imec-publications.be/handle/20.500.12860/17528Smooth and high quality epitaxial strained Ge grown on SiGe strain relaxed buffers with 70 - 85% GeProceedings paper