Schaekers, MarcMarcSchaekersCapon, BorisBorisCaponDetavernier, ChristopheChristopheDetavernierBlasco, NicolasNicolasBlasco2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17954The deposition Of Ru and RuO2 flms for DRAM electrodeProceedings paper