Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Erdmann, AndreasAndreasErdmannMesilhy, HazemHazemMesilhyEvanschitzky, PeterPeterEvanschitzkyPhilipsen, VickyVickyPhilipsenTimmermans, FrankFrankTimmermansBauer, MarkusMarkusBauer2022-01-202021-11-022022-01-2020201932-5150WOS:000604919000003https://imec-publications.be/handle/20.500.12860/38293Perspectives and tradeoffs of absorber materials for high NA EUV lithographyJournal article10.1117/1.JMM.19.4.041001WOS:000604919000003AERIAL IMAGEMASK