Update on main chain scission resists in Zeon for high-NA EUV lithography

Shirotori, AkihideAkihideShirotoriOda, YujiYujiOdaTaguchi, KazunoriKazunoriTaguchiYeh, Sin FuSin FuYehSuh, Hyo SeonHyo SeonSuhDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenbergheSanuki, HideakiHideakiSanuki2024-03-042024-01-132024-03-042023978-1-5106-6748-80277-786XWOS:001125089900029https://imec-publications.be/handle/20.500.12860/43410Update on main chain scission resists in Zeon for high-NA EUV lithographyProceedings paper10.1117/12.2686602978-1-5106-6749-5WOS:001125089900029