Apparent and steady-state etch rates in thin film etching and underetching of microstructures. II: Characterisation

Van Barel, GregoryGregoryVan BarelDu Bois, BertBertDu BoisVan Hoof, RitaRitaVan HoofDe Wachter, JefJefDe WachterDe Ceuninck, WardWardDe CeuninckWitvrouw, AnnAnnWitvrouw2021-10-182021-10-1820100960-1317https://imec-publications.be/handle/20.500.12860/18142Apparent and steady-state etch rates in thin film etching and underetching of microstructures. II: CharacterisationJournal articlehttp://iopscience.iop.org/0960-1317/20/5/055034