Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E

Gogolides, E.E.GogolidesBaik, Ki-HoKi-HoBaikYannakopolou, K.K.YannakopolouVan den hove, LucLucVan den hove2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/176Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214EJournal article