Wang, Xin PengXin PengWangWouters, DirkDirkWoutersToeller, MichaelMichaelToellerMeersschaut, JohanJohanMeersschautGoux, LudovicLudovicGouxChen, YangyinYangyinChenGovoreanu, BogdanBogdanGovoreanuPantisano, LuigiLuigiPantisanoDegraeve, RobinRobinDegraeveJurczak, GosiaGosiaJurczakAltimime, LaithLaithAltimimeKittl, JorgeJorgeKittl2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20136Influence of process parameters on low current resistive switching in MOCVD and ALD NiO FilmsProceedings paper