Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

Pforr, RainerRainerPforrWong, AlfredAlfredWongRonse, KurtKurtRonseVan den hove, LucLucVan den hoveYen, AnthonyAnthonyYenPalmer, S.S.PalmerFuller, G.G.FullerOtto, O.O.Otto2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/821Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithographyProceedings paper