Thin epitaxial Si film growth at low temperatures for germanium processing applications

Bonzom, RenaudRenaudBonzomLeys, FrederikFrederikLeysHellin, DavidDavidHellinLoo, RogerRogerLooCaymax, MattyMattyCaymaxVandervorst, WilfriedWilfriedVandervorst2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10126Thin epitaxial Si film growth at low temperatures for germanium processing applicationsOral presentation