Dependence of EUV mask printing performance on blank architecture

Jonckheere, RikRikJonckheereHyun, YoonsukYoonsukHyunIwamoto, FumioFumioIwamotoBaudemprez, BartBartBaudemprezHermans, JanJanHermansLorusso, GianGianLorussoPollentier, IvanIvanPollentierGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonse2021-10-172021-10-172008-03https://imec-publications.be/handle/20.500.12860/13930Dependence of EUV mask printing performance on blank architectureProceedings paper